Mirror holder double tripode type

This precision device, designed for mirrors under UHV conditions on beamlines, enables position adjustment in the two axes of rotation and height adjustment of two mirrors.

This configuration is specially adapted for :
- low pass filter for lithography
- insertion of two mirrors in a sole chamber in case of narrow space between two beamlines.

Design features :
Each mirror is supported by three motor driven vertical actuators.
These actuators control the pitch, roll and displacement along the Z axis.
The base of each actuator lies on a heavy steel girder which allows to adjust the average position of the mirror with regard to the X-ray beam.

The vessel allows top loading of the mirrors. It is equipped with a lid in order to remain installed on the beamline when opening it.
The base is equipped with bellows for the actuators.

References
This product has been delivered to :
CAMD : XRLM1 beamline

Full documentation